Table 3 Thickness evolution of the thin films obtained LbL-E deposition technique
Fabrication process | Thickness (nm) | LSPR (λmax; Amax) |
---|---|---|
[PAH(9.0)/PAA-AgNPs(9.0)]10 | 63 ± 5 | 421.3 nm; 0.017 |
[PAH(9.0)/PAA-AgNPs(9.0)]20 | 165 ± 4 | 432.1 nm; 0.13 |
[PAH(9.0)/PAA-AgNPs(9.0)]30 | 507 ± 16 | 432.3 nm; 0.77 |
[PAH(9.0)/PAA-AgNPs(9.0)]40 | 642 ± 12 | 432.6 nm; 1.18 |