Figure 3From: Tuning oxygen impurities and microstructure of nanocrystalline silicon photovoltaic materials through hydrogen dilutionTypical XPS Si 2p spectrum of the nc-Si:H thin film under RH = 98.2%. The splitting of 0.6 eV is shown with all the intermediate oxidation states. The inset presents the surface oxygen content as a function of RH.Back to article page