Figure 2From: Aluminum silicide microparticles transformed from aluminum thin films by hypoeutectic interdiffusionLSM images of an as-deposited and annealed Al films on Si substrate. (a) As-deposited film. Samples annealed at 550°C: (b) 3 h, (c) 6 h, (d and e) 9 h. (a to d) 40-nm-thick Al films and (e) 90-nm-thick Al film. Scale bars 20 μm.Back to article page