Figure 7From: Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growthXRD profiles of annealed double layers of PSi with cross-sectional SEM images of different annealing times (1, 5, 10 and 30 min). The PSi-peak shift toward the Si-peak suggests a decrease of strain with annealing time that may be correlated with the disappearance of pillars in the HPL.Back to article page