Table 3 Theoretical and experimental values
From: Compositional and optical properties of SiO x films and (SiO x /SiO y ) junctions deposited by HFCVD
Tg (°C) | Gap E N of Si-nc (eV) | Diameter of Si-nc (nm) | Diameter of Si-nc (nm) by HRTEM [[7]] |
|---|---|---|---|
1,150 | 1.67 | 3.96 | 5.5 |
1,020 | 1.89 | 3.11 | 4 |
900 | 2.28 | 2.31 | 2.5 |