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Table 5 Defect types linked[1924] with the peak position

From: Compositional and optical properties of SiO x films and (SiO x /SiO y ) junctions deposited by HFCVD

Defect type

Peak position (nm)

As grown

1,150/1,020°C

1,150/900°C

1,020/1,150°C

1,020/900°C

900/1,150°C

900/1,020°C

WOB

-

-

-

408

406

414

NOV defect

449

438

432

-

-

-

E'δ defect

532

534

-

559

542

514

NBOHC

648

622

667

674

672

644

None identified

805

782

795

789

770

780

  1. Peak position obtained by deconvolution from PL spectra of the (SiO x /SiO y ) junctions as function of the Tg.

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