References | Device structure | Total dose | Resistance | Operation voltage |
---|
| | | Initial | Low | High | Forming | Set | Reset |
---|
[11] | Cu/HfO2:Cu/Pt | 360 krad (Si) | NA | √ | ↓ | √ | ↑ | √ |
[13] | Pt/TiO2/Pt | 14 Mrad (Si) | NA | √ | √ | NA | NA | NA |
[15] | TiN/TaO
x
/Pt | 180 krad (Si) | ↑ | √ | ↓ | NA | NA | NA |
This work
| Ag/AlO
x
/Pt | 1 Mrad (Si) | ↓ | √ | ↓ | ↑ | √ | √ |
- NA, not available; √, no or negligible change; ↑, increase; ↓, decrease.