Figure 2
From: Formation of nanostructured silicon surfaces by stain etching

SEM images for Si/Pd substrate etched in HF/V 2 O 5 solution for different times. (a) 30, (b) 60, (c) 90, and (d) 120 min.
From: Formation of nanostructured silicon surfaces by stain etching
SEM images for Si/Pd substrate etched in HF/V 2 O 5 solution for different times. (a) 30, (b) 60, (c) 90, and (d) 120 min.