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Figure 1 | Nanoscale Research Letters

Figure 1

From: Effect of sulfur hexafluoride gas and post-annealing treatment for inductively coupled plasma etched barium titanate thin films

Figure 1

The schematic diagram of this study. (a) The aerosol deposition instrument in our laboratory, (b) schematic of the room-temperature growth of the BTO thin film on a substrate, (c) the fabrication flow of the preparation of Ti/Cr shadow metal mask, (d) the ICP etching equipment in KANC, and (e) the mini furnace machine (courtesy of Inter-university Semiconductor Research Center of Seoul National University).

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