Figure 3
Top and cross-sectional micrographs of nPS samples fabricated using e-LEF setup. Effect of LEF at locations close to the anode and cathode: (a-b) 30 V for 10 min and (c-d) 50 V for 3 min. (e) Top image close to the anodic region of the sample etched at 50 V during 5 min and (f) cross-sectional view of the n++ sample etched applying a lateral current of 25 mA for 5 min.