Figure 2From: Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gasEtch rates and selectivity of BaTiO 3 films. Etch rates of BaTiO3 films (black solid line) and selectivity of BaTiO3 to Ti/Cr shadow mask (red dashed line) as a function of the different fluorine-based mixture gas.Back to article page