Figure 3From: Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gas3-D view of surface morphologies of the BaTiO 3 thin films by AFM. (a) As-deposited, (b) etched in the CF4/O2 plasma, (c) etched in the C4F8 plasma, and (d) etched in the SF6 plasma. The etching time is set to 3 min, and the scanned areas are all 10 × 10 μm2.Back to article page