Figure 2From: Cross-sectional analysis of W-cored Ni nanoparticle via focused ion beam milling with impregnationArtifacts of the cross-sectional TEM sample via cold compaction and FIB milling. (a) Preferential milling. (b) Re-deposition of sputtered species on the nanoparticle surface during milling of the dispersed nanoparticle on silicon wafer.Back to article page