Table 1 Evolution of the effective diffusion length of the mc-Si wafer after PS and TiO 2 :Cr/PS treatments
Sample | |||||
---|---|---|---|---|---|
mc-Si | PS/mc-Si | TiO2:Cr/PS/mc-Si | |||
[Cr] = 0 at. % | [Cr] = 2 at. % | [Cr] = 13 at. % | |||
L (μm) | 100 | 181 | 220 | 958 | 72 |
Sample | |||||
---|---|---|---|---|---|
mc-Si | PS/mc-Si | TiO2:Cr/PS/mc-Si | |||
[Cr] = 0 at. % | [Cr] = 2 at. % | [Cr] = 13 at. % | |||
L (μm) | 100 | 181 | 220 | 958 | 72 |