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Table 1 The pressure of chamber during the growth

From: Physical and electrical properties of graphene grown under different hydrogen flow in low pressure chemical vapor deposition

H2flow rate (sccm) Total pressure/H2partial pressure (mTorr)
10 353/16.8
100 792/364
200 980/264
300 998/598.8
400 2,470/1,646.7
500 2,780/1,985.7
  1. Ar/H2/CH4 = 100/10 ~ 500/100 sccm.