Figure 4From: Maskless micro/nanofabrication on GaAs surface by friction-induced selective etchingEffect of normal load on the fabrication of GaAs surface by scratching and post-etching. (a) AFM images of the scratches created on the GaAs surface under various normal loads. (b) AFM images of the nanolines on the GaAs surface after etching in H2SO4 aqueous solution for 30 min. The cross-sectional profiles were plotted below for the comparison.Back to article page