Figure 7From: Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrixCross-sectional TEM images. At the near-surface of (a) 350°C treatment sample, (b) 600°C treatment sample, (c) magnified image of 350°C treatment sample, and (d) magnified image of 600°C treatment sample.Back to article page