Figure 1From: Enhancement of antireflection property of silicon using nanostructured surface combined with a polymer depositionSchematics of the fabrication process for the Si nanostructures. (a, b) The Si sheets were etched using hydrogen and argon mixture gases under 1 × 10−2 Torr at different high temperatures. (c) The Si-based polymer (PDMS) deposition on the Si nanostructures for enhancing the AR property.Back to article page