Figure 2

Tilted FESEM images of the Si nanostructures etched by various flow rates of mixture gas. (a) 0.5 sccm. (b) 2.5 sccm. (c) 5.0 sccm. Inset: magnified FESEM images of the aggregate of nanoparticles.
Tilted FESEM images of the Si nanostructures etched by various flow rates of mixture gas. (a) 0.5 sccm. (b) 2.5 sccm. (c) 5.0 sccm. Inset: magnified FESEM images of the aggregate of nanoparticles.