Figure 1

SEM cross-sectional images of Fe ₃ O ₄ thin films grown on a SiO ₂ /Si substrate at 300°C using PLD. (a) 100 nm, (b) 300 nm, and (c) 400 nm. The insets show the AFM images of each thin film. (d) A summary of the prepared Fe₃O₄ thin film, including rms roughness, film thickness, deposition time, and grain size information.