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Table 1 Summary of deposition conditions of TiO 2 films

From: Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering

Base pressure 1.4 ×10−3 Pa
Working pressures 3 Pa at a substrate bias of 0 V,
5 Pa at a substrate bias of 0 V,
3 Pa at a substrate bias of −50 V
Deposition time 5 Hrs for each sample
RF Power 150 W
Argon flow rate 30 sccm
Oxygen flow rate 10 sccm
Target to substrate distance 70 mm
Diameter of silicon (100) substrate 25.4 mm
Diameter of the titanium target 60 mm