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Table 1 Summary of deposition conditions of TiO 2 films

From: Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering

Base pressure

1.4 ×10−3 Pa

Working pressures

3 Pa at a substrate bias of 0 V,

5 Pa at a substrate bias of 0 V,

3 Pa at a substrate bias of −50 V

Deposition time

5 Hrs for each sample

RF Power

150 W

Argon flow rate

30 sccm

Oxygen flow rate

10 sccm

Target to substrate distance

70 mm

Diameter of silicon (100) substrate

25.4 mm

Diameter of the titanium target

60 mm

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