Figure 3From: The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition Thickness dependence of refractive index for ALD-Al 2 O 3 films. (a) As deposited and annealed at (b) 400°C, (c) 600°C, and (d) 900°C in nitrogen. The inset is the growth rate of as deposited Al2O3 films.Back to article page