Account

Table 1 RMS roughness of ALD-Al ₂ O ₃ thin films

From: The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

	Sample (cycles)
	50	100	300	500
Annealing temperature (°C)	RMS roughness (nm)
As deposited	0.65	0.62	0.49	0.60
400	0.54	0.55	0.58	0.42
600	0.49	0.51	0.53	0.52
900	0.54	0.46	0.40	0.54

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