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Table 1 RMS roughness of ALD-Al 2 O 3 thin films

From: The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

  Sample (cycles)
50 100 300 500
Annealing temperature (°C) RMS roughness (nm)
As deposited 0.65 0.62 0.49 0.60
400 0.54 0.55 0.58 0.42
600 0.49 0.51 0.53 0.52
900 0.54 0.46 0.40 0.54