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Table 2 Resistivity, carrier concentration, and mobility of the films before and after annealing in different ambients

From: Effects of doping and annealing on properties of ZnO films grown by atomic layer deposition

Al (at.%)

ρ (Ω • cm)

n (cm −3 )

μ (cm 2 / Vs )

ρ (Ω • cm)

n (cm −3 )

μ (cm 2 / Vs )

 

As-grown

Annealed in air

0

2.7 × 10−2

1.4 × 1019

16.40

2.6 × 102

-

-

1

6.1 × 10−3

9.7 × 1019

10.56

3.2 × 101

-

-

2

6.4 × 10−3

1.5 × 1020

6.33

2.0 × 101

-

-

3

5.3 × 10−3

2.1 × 1020

5.63

2.1 × 101

-

-

4

7.7 × 10−3

1.8 × 1020

4.38

4.0 × 101

-

-

 

Annealed in Ar

Annealed in N2

0

6.0 × 101

-

-

4.4 × 102

-

-

1

3.1 × 10−1

2.2 × 1019

0.91

2.1 × 100

5.9 × 1018

0.50

2

1.1 × 10−1

5.7 × 1019

0.98

3.0 × 10−1

3.4 × 1019

0.60

3

6.8 × 10−2

7.8 × 1019

1.12

5.0 × 10−1

3.2 × 1019

0.39

4

1.1 × 10−1

5.6 × 1019

0.97

1.8 × 100

4.8 × 1018

0.70

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