Skip to main content
Account
Figure 2 | Nanoscale Research Letters

Figure 2

From: Investigation on the passivated Si/Al2O3 interface fabricated by non-vacuum spatial atomic layer deposition system

Figure 2

HR-SEM images for various cycles of deposition and deposition rate of non-vacuum spatial ALD. (a) HR-SEM images for various cycles of deposition of Al2O3 films including 50, 200, 300, and 400 cycles and (b) deposition rate of non-vacuum spatial ALD. This figure can verify the basic characteristic of deposition rate for a self-developed non-vacuum spatial ALD. The image also shows the uniformity of the Al2O3 films, revealing its reproducibility.

Back to article page

Navigation