Figure 2From: Investigation on the passivated Si/Al2O3 interface fabricated by non-vacuum spatial atomic layer deposition system HR-SEM images for various cycles of deposition and deposition rate of non-vacuum spatial ALD. (a) HR-SEM images for various cycles of deposition of Al2O3 films including 50, 200, 300, and 400 cycles and (b) deposition rate of non-vacuum spatial ALD. This figure can verify the basic characteristic of deposition rate for a self-developed non-vacuum spatial ALD. The image also shows the uniformity of the Al2O3 films, revealing its reproducibility.Back to article page