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Table 1 Thickness deviation and GPC vary on different plasma powers

From: Uniformity and passivation research of Al2O3 film on silicon substrate prepared by plasma-enhanced atom layer deposition

Plasma power (W)

Standard deviation

GPC ( nm/cycle )

80

0.353 nm (2.0%)

0.131

45

0.155 nm (0.7%)

0.111

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