Figure 1From: Silicon diffusion control in atomic-layer-deposited Al2O3/La2O3/Al2O3 gate stacks using an Al2O3 barrier layer Schematic structure of Al 2 O 3 /La 2 O 3 /Al 2 O 3 /Si stacks. The thickness of Al2O3 barrier layer between Si substrate and La2O3 layer in samples S1 ~ S4 changes with the number of ALD cycles.Back to article page