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Figure 5 | Nanoscale Research Letters

Figure 5

From: Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique

Figure 5

Reflectance spectra and spatial distribution of the electric field intensity, | E / E 0 | 2 , of the NC array. (a) Experimental data (solid line) and FDTD simulation (open symbols) of the optical reflectance of the NC array and a cross-sectional view of the field intensity near the surface of the NC at wavelengths of (b) 450 nm, (c) 550 nm, and (d) 750 nm. E 0 indicates the electric field of the incident light.

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