Figure 2From: Nano-oxide thin films deposited via atomic layer deposition on microchannel plates Schematic illustration of ALD Al 2 O 3 growth process. First layer sequence: on substrate surface (A 1 ), pulsing TMA after purge (B 1 ), then pulsing H2O after purge (A 2 ). Second layer sequence: pulsing TMA after purge (B 2 ), then pulsing H2O after purge (A 3 ).Back to article page