Figure 4From: Nano-oxide thin films deposited via atomic layer deposition on microchannel plates Photographs of ALD-MCP samples at different process steps. Pictures of bare 33 mm MCP (A), ZnO:Al2O3 (84 nm)/Al2O3 (8 nm) deposition (B), ZnO:Al2O3 (115 nm)/Al2O3 (8 nm) deposition (C), and after 250-nm NiCr electrode deposition (D).Back to article page