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Table 1 Detailed ALD experimental parameters for conductive and SEE layers

From: Nano-oxide thin films deposited via atomic layer deposition on microchannel plates

Description Condition 1 Condition 2 Condition 3 Condition 4
Conductive layer Thickness (nm) Approximately 84 Approximately 98 Approximately 115 Approximately 242
ZnO/Al2O3 ratio Percentage of ZnO cycles = 75%
SEE layer Pure Al2O3, approximately 8 nm
Substrates n-Si (100), glass, MCPs
XRD analysis Amorphous structure
Other measurements SEM, XPS, EDS, and electrical characterization for MCPs