Table 1 Detailed ALD experimental parameters for conductive and SEE layers
From: Nano-oxide thin films deposited via atomic layer deposition on microchannel plates
Description | Condition 1 | Condition 2 | Condition 3 | Condition 4 | |
|---|---|---|---|---|---|
Conductive layer | Thickness (nm) | Approximately 84 | Approximately 98 | Approximately 115 | Approximately 242 |
ZnO/Al2O3 ratio | Percentage of ZnO cycles = 75% | ||||
SEE layer | Pure Al2O3, approximately 8 nm | ||||
Substrates | n-Si (100), glass, MCPs | ||||
XRD analysis | Amorphous structure | ||||
Other measurements | SEM, XPS, EDS, and electrical characterization for MCPs | ||||