Fig. 3
Schematic representation of nanocomposite films, obtained by annealing of the as-deposited films in air. a SiO x , Т an = 750 °C; b SiO x , Т an = 1000 °C; c SiO x < Er,F>, Т an = 750 °C; d SiO x < Er,F>, Т an = 1000 °C
Fig. 3 | Nanoscale Research Letters
