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Fig. 1 | Nanoscale Research Letters

Fig. 1

From: Evidence for Kinetic Limitations as a Controlling Factor of Ge Pyramid Formation: a Study of Structural Features of Ge/Si(001) Wetting Layer Formed by Ge Deposition at Room Temperature Followed by Annealing at 600 °C

Fig. 1

A RHEED pattern and an STM image of the initial Ge film. a The RHEED pattern obtained at the room temperature after Ge film deposition before sample heating (the effective thickness h Ge = 7 Å; [110] azimuth, E = 10 keV) and b its profile taken along the light line in the panel (a); arrows in the panel (b) indicate the weak ½-reflexes virtually unobservable at the fluorescent screen during the experiments but visible in the panel (a) which demonstrate that the 2 × 1 structure occupies a minor part of the film surface area. c The STM image demonstrates a grainy disordered structure of the film

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