Fig. 5From: Three-Dimensional Metal-Oxide Nanohelix Arrays Fabricated by Oblique Angle Deposition: Fabrication, Properties, and ApplicationsTunability of refractive indices. Refractive indices of ITO, TiO2, and SiO2 thin films as a function of the vapor incident angle. ITO at λ = 474 nm, TiO2 at λ = 550 nm, and SiO2 at λ = 460 nmBack to article page