Fig. 2From: Scalable Fabrication of Quasi-Three-Dimensional Chiral Plasmonic Oligomers Based on Stepwise Colloid Sphere Lithography Technology a Schematic diagram of material deposition on assembled PS array monolayer. Where θ is the deposition angle, which is defined as the material vapor beam with respect to the substrate normal, and Φ is the azimuth angle with respect to the PS array monolayer. b The measured CD spectra of LHCPO (green) and RHCPO (aubergine) with θ = 20°, k 1, 2, 3, 4 = 8, 25, 40, and 55 nm, respectively, and ΔΦ = ±60°. The insets are the related CPO SEM imagesBack to article page