Fig. 6

SEM images of spin-coated 100-nm F-SiO2 NPs with different concentrations on TESPSA-functionalized Si wafers: a 0.1, b 0.4, c 0.8, and d 1.2 wt.%. The insets in c and d are high-magnification images. Scale bars: 1 μm. Reprinted with permission from [80]. Copyright (2012) American Chemical Society