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Fig. 2 | Nanoscale Research Letters

Fig. 2

From: Step-and-Repeat Nanoimprint-, Photo- and Laser Lithography from One Customised CNC Machine

Fig. 2

a Photograph of the custom-built tool being used to pattern a 4-in. Si wafer. Scale bar = 8 cm. b Photograph of a 4-in. Si wafer coated with Delo-Katiobond featuring stepped out 7 mm2 imprints of disordered nanopillars. Scale bar = 14 mm. c Top-down SEM image of the imprinted 200-nm diameter disordered nanopillars in Delo-Katiobond. Scale bar = 1 μm. d Cross-section at 90° tilt of the same sample as c following Si etching. Scale bar = 500 nm. e Photograph of the 4-in. wafer shown in b following Si etching and stripping of the resist in piranha etch

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