Fig. 4From: Step-and-Repeat Nanoimprint-, Photo- and Laser Lithography from One Customised CNC Machine a Screen capture of the microchannel mixer design being exposed with the laser lithography tool. Scale bar = 600 μm. b Photograph of a developed SU-8 pattern on Si. Scale bar = 2.5 mm. c Photograph of a relieved PDMS casting from the sample shown in b bonded to a quartz slide to seal the hollow channel. Scale bar = 2.5 mm. d–e Optical micrograph showing part of the design exposed via laser lithography into d S1805 and e Nano SU-8 post development. f Optical micrograph of the PDMS/quartz device shown in c. d–f At the same magnification, scale bar shown in d = 150 μmBack to article page