Table 2 Comparison of the converted CNC machine criteria to purposely built commercial counterparts (data for which was determined from official data sheets; Suss power density was given for the discrete wavelength, whereas EVG was approximated for broadband spectrum range 300–500 nm)
From: Step-and-Repeat Nanoimprint-, Photo- and Laser Lithography from One Customised CNC Machine
Model | Custom tool | Suss MA/BA6 | EVG 770 NIL Stepper |
|---|---|---|---|
Price | $ | $$$$ | $$$$$ |
Power density (mW/cm2) @ 365 nm | 102.0 | 7.1 | ~20.0 |
Desktop unit | Yes | No | No |
X/Y accuracy (μm) | <50.0 | 0.5 | 0.5 |
Optical alignment | No | Yes | Yes |
Maximum substrate (mm) | 390 | 150 | 300 |
Active force control | Yes | No | Yes |
Imprint environment | Air | Air | Vacuum/inert gas |
Temperature control | Yes | No | No |
Laser lithography | Yes | No | No |