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Table 3 Tested resist performance criteria

From: Step-and-Repeat Nanoimprint-, Photo- and Laser Lithography from One Customised CNC Machine

Performance criteria AMO NIL MMS4 DELO-KATIOBOND OM VE 110707
Imprint pressure (kPa) 475 376
Curing dose (J/cm2) 8.0 0.4
Etched by O2 plasma No Yes
Si:resist etch ratio 1:1 4.87:1
Maximum iterations/soft-PDMS stamp 14 34
Radiation bleed (μm) 300 70