Table 3 Tested resist performance criteria
From: Step-and-Repeat Nanoimprint-, Photo- and Laser Lithography from One Customised CNC Machine
Performance criteria | AMO NIL MMS4 | DELO-KATIOBOND OM VE 110707 |
|---|---|---|
Imprint pressure (kPa) | 475 | 376 |
Curing dose (J/cm2) | 8.0 | 0.4 |
Etched by O2 plasma | No | Yes |
Si:resist etch ratio | 1:1 | 4.87:1 |
Maximum iterations/soft-PDMS stamp | 14 | 34 |
Radiation bleed (μm) | 300 | 70 |