Fig. 4

Nano-transfer print of 75 nm Au/Ti metal pillars. The resulting transfer yield is shown as a function of (a) temperature during the imprint process, (b) applied gas pressure and the calculated effective pressure below the pillar structures, and (c) oxygen plasma pretreatment duration of the stamp (while keeping a constant substrate activation duration of 6 min). An attempt with neither substrate nor stamp activation is marked with an open symbol, (d) duration of the nTP process