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Table 1 Typical values of the forming/switching voltage and SET/RESET resistance for memristor devices with different HfO2 layer thickness

From: Crossbar Nanoscale HfO2-Based Electronic Synapses

d HfO2, nm

Forming voltage, V

U Set, V

U Reset, V

R HRS, Ω

R LRS, Ω

3

1 ÷ 2.3

0.7 ÷ 1.2

−1 ÷ −1.3

200 ÷ 6000

30 ÷ 200

4

1.3 ÷ 2.8

0.7 ÷ 1

−1 ÷ −1.3

200 ÷ 5000

35 ÷ 200

5

2.4 ÷ 3.8

0.7 ÷ 1

−0.95 ÷ −1.3

400 ÷ 5000

50 ÷ 400

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