Table 1 Characteristics of the sputtered aluminum thin films
From: Formation of Nanoporous Anodic Alumina by Anodization of Aluminum Films on Glass Substrates
Sputtering parameter of Al | 1st group, samples | 2nd group, samples | 3rd group, samples | 4th group, samples | |||||||
|---|---|---|---|---|---|---|---|---|---|---|---|
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 11 | |
Deposition rate (nm/s) | 0.55 | 1.1 | 2.2 | 0.55 | 0.55 | 1.1 | 1.1 | 1.1 | 0.55 | 1.1 | 2.2 |
Film thickness (nm) (±5 %) | 340 | 340 | 340 | 230 | 340 | 230 | 340 | 510 | 230 | 230 | 230 |