Fig. 7From: Effect of Oxidation Condition on Growth of N: ZnO Prepared by Oxidizing Sputtering Zn-N Film a Cross-sectional TEM image and content ratio of Zn/O at different regions for the film oxidized at 400 °C for 60 min. b SEM morphology of the film. c Cross-sectional HRTEM image for the film oxidized at 400 °C for 60 minBack to article page