Fig. 4From: On the Crystal Structural Control of Sputtered TiO2 Thin FilmsCross-sectional bright-field TEM images of TiO2 films with thicknesses of 50 nm (a), 100 nm (b), 200 nm (c) and 500 nm (d). e–h The corresponding sketch images of the cross-sectional microstructures. The insets are the selected-area electron diffraction patternsBack to article page