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Table 1 Deposition rate (nm · min−1) of TiO2 films at different oxygen flow ratios

From: On the Crystal Structural Control of Sputtered TiO2 Thin Films

O2 flow ratio 0 % 20 % 40 % 60 %
Off-axis position 1 17.5 1.62 0.98 1.03
Off-axis position 2 15.4 1.20 0.78 0.92
Facing position 11.9 1.09 0.70 0.83