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Table 1 The structures and thicknesses of annealed samples S1~S5

From: Impacts of Annealing Conditions on the Flat Band Voltage of Alternate La2O3/Al2O3 Multilayer Stack Structures

Sample

Film structures

Thickness (nm)

S1

1 × (40-cycle Al2O3 + 40-cycle La2O3)

7.06

S2

2 × (20-cycle Al2O3 + 20-cycle La2O3)

7.02

S3

4 × (10-cycle Al2O3 + 10-cycle La2O3)

6.99

S4

40 × (1-cycle Al2O3 + 1-cycle La2O3)

7.57

S5

4 × (20-cycle Al2O3 + 20-cycle La2O3)

13.4

  1. The samples were annealed at 600 °C for 60 s

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