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Table 1 The structures and thicknesses of annealed samples S1~S5

From: Impacts of Annealing Conditions on the Flat Band Voltage of Alternate La2O3/Al2O3 Multilayer Stack Structures

Sample Film structures Thickness (nm)
S1 1 × (40-cycle Al2O3 + 40-cycle La2O3) 7.06
S2 2 × (20-cycle Al2O3 + 20-cycle La2O3) 7.02
S3 4 × (10-cycle Al2O3 + 10-cycle La2O3) 6.99
S4 40 × (1-cycle Al2O3 + 1-cycle La2O3) 7.57
S5 4 × (20-cycle Al2O3 + 20-cycle La2O3) 13.4
  1. The samples were annealed at 600 °C for 60 s