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Table 2 The annealing conditions and thicknesses of samples S2 and S6~S10

From: Impacts of Annealing Conditions on the Flat Band Voltage of Alternate La2O3/Al2O3 Multilayer Stack Structures

Sample

Temperature (°C)

Duration (s)

Thickness (nm)

S2

600

60

7.02

S6

700

60

7.21

S7

800

60

7.20

S8

600

30

7.08

S9

600

90

7.07

S10

600

120

7.12

  1. Samples S6~S10 have the same film structure with S2: 2 × (20-cycle Al2O3 + 20-cycle La2O3)

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