Skip to main content

Table 2 The annealing conditions and thicknesses of samples S2 and S6~S10

From: Impacts of Annealing Conditions on the Flat Band Voltage of Alternate La2O3/Al2O3 Multilayer Stack Structures

Sample Temperature (°C) Duration (s) Thickness (nm)
S2 600 60 7.02
S6 700 60 7.21
S7 800 60 7.20
S8 600 30 7.08
S9 600 90 7.07
S10 600 120 7.12
  1. Samples S6~S10 have the same film structure with S2: 2 × (20-cycle Al2O3 + 20-cycle La2O3)