Fig. 2From: Comparison of Silicon Nanocrystals Prepared by Two Fundamentally Different MethodsLow-pressure gas-phase plasma reactor. The plasma reactor (a) is composed of a quartz tube, two RF electrodes, gas inlet, and a sample holder. Plasma is generated between two RF electrodes (b) and SiNCs are collected in a glass sample holder (c). Final stage of production of the plasma-synthetized SiNCs (d)Back to article page