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Table 1 Some parameters of typical samples investigated, T = 296 K

From: Structural and Magnetoresistive Properties of Nanometric Films Based on Iron and Chromium Oxides on the Si Substrate

 

Sample composition

R 0,

kOhm

Thickness obtained by

Roughness, nm

(Si - film)

(film - air)

R a,

(AFM)

Profilometer, (nm)

XRR (nm)

#1

Fe2O3 − X , (0 ≤ x ≤ 1)

47.0

80 ± 4

73 ± 1

1.4

0.9

0.939

#2

Cr3 − X O3 − Y , (0 ≤ x ≤ 2; 0 ≤ y ≤ 2)

512.0

55 ± 2.75

1.092

#3

Fe2O3 − Y /Cr3 − X O3 − Y /Fe2O3 − Y /Cr3 − X O3 − Y

22.0

50 ± 2.5

#4

Fe2O3 − Y /Cr3 − X O3 − Y /Fe2O3 − Y /Cr3 − X O3 − Y

7.0

10

10.8 ± 0.5

1.4

1.2

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